Thinfilm Process Technology for functional polyer films
Based on the innovative iCVD and oCVD approaches, originally developed by Karen Gleason and her team at the MIT, Cambridge, MA, and in collaboration with our partner GVD we offer systems and solutions to develop novel polymer-based thinfilm coatings for a variety of applications.
Advantages over conventional technologies:
- Conformal coating of micro- & nano-scale features
- Chemical specificity unattainable with solution polymerization
- Uniformity over sharp and fine features is greatly improved